carbon nitride meaning in Chinese
碳氮化物
Examples
- Progress in synthesis of carbon nitride crystals
氮化碳晶体的合成研究进展 - Progress of the research on carbon nitride materials
氮化碳材料的研究进展 - By using the uv - vis spectrophotometer and data processing , we get to know that the carbon nitride films have a wide optical band gap of 4 . 14ev , which is 2 . 2ev lower than the theoratical band gap of 6 . 6 0 . 5ev
通过数据处理，得到了吸收率谱，从而得出光能隙为4 . 14ev 。比理论计算值6 . 4ev 0 . 5小2 . 2ev 。这是因为我们的样品是由非晶组成的。 - The properties of crystalline carbon nitride films ( cn ) on silicon substrate have been explored experimentally by the pe - pld and pe - cvd method . the relation between different deposition parameter and the structure properties of cn compound films is analyzed ; the deposition mechanism of the cn films is studied . cn thin films with up to 21at % nitrogen content have been prepared by pld method
本论文采用pe - pld技术和pe - cvd技术，以si基片为衬底对晶态cn薄膜制备进行了实验探索，主要探讨不同工艺条件和cn化合物薄膜的结构特性之间的关系，研究晶态si基cn薄膜的生长机理。 - Preliminary studies have been shown that diamond - like carbon ( dlc ) had a great potential as a durable , wear and corrosion - resistant coating for biomedical implants . surprisingly , carbon nitride ( cnx ) has not received much attention recently in the biomedical field , despite its performance comparable to or greater than that of dlc in this study , cnx and dlc coatings were prepared using the standard dc magnetron sputtering at room temperature
本文采用磁控溅射( magnetronsputtering )技术尝试在单晶si样品表面沉积制备碳氮薄膜，研究了薄膜的结构特征、性能与制备工艺参数之间的规律，并考察细胞在碳氮薄膜上的吸附特性随制备工艺参数的变化机理，并与类金刚石膜在凝血时间、细胞吸附特性等方面做了对比。